Glow Discharge Cleaner GDC-100
The “downstream” plasma generated by glow discharge can generate ROS on the surface of the sample, which can improve the hydrophilicity of the sample.
Classification:
Accessories/Auxiliary Equipment
Core advantages
Core Advantages
- Special structural design, short processing time.
- Metal chamber equipped, effectively mitigates electrical breakdown.
- Sample stage adjustable with 20mm travel, supports large sample handling.
- 49-hole copper grid holder included, enables batch processing.
- Fully automated operation, multiple safety interlocks.
User Interface
- 产品描述
- 用户界面
- 性能参数
- 应用案例
-
- Commodity name: Glow Discharge Cleaner GDC-100
The “downstream” plasma generated by glow discharge can generate ROS on the surface of the sample, which can improve the hydrophilicity of the sample.
Core Advantages
- Special structural design, short processing time.
- Metal chamber equipped, effectively mitigates electrical breakdown.
- Sample stage adjustable with 20mm travel, supports large sample handling.
- 49-hole copper grid holder included, enables batch processing.
- Fully automated operation, multiple safety interlocks.
-
Parameters of Glow Discharger Cleaner Dimensions (L*W*H) 435*380*310mm Weight 15kg Chamber Dimensions 120*120*120mm Workbench Dimensions Φ70 Touchscreen Dimensions 7 inch Vacuum Pumping Time ﹤1min Cleaning Power 1-100W Sample Stage Elevation Range 0-20mm -


Before glow treatment After glow treatment 

Before silicon wafer cleaning:75.9° After silicon wafer cleaning:5.5°
Performance parameters
- 产品描述
- 用户界面
- 性能参数
- 应用案例
-
- Commodity name: Glow Discharge Cleaner GDC-100
The “downstream” plasma generated by glow discharge can generate ROS on the surface of the sample, which can improve the hydrophilicity of the sample.
Core Advantages
- Special structural design, short processing time.
- Metal chamber equipped, effectively mitigates electrical breakdown.
- Sample stage adjustable with 20mm travel, supports large sample handling.
- 49-hole copper grid holder included, enables batch processing.
- Fully automated operation, multiple safety interlocks.
-
Parameters of Glow Discharger Cleaner Dimensions (L*W*H) 435*380*310mm Weight 15kg Chamber Dimensions 120*120*120mm Workbench Dimensions Φ70 Touchscreen Dimensions 7 inch Vacuum Pumping Time ﹤1min Cleaning Power 1-100W Sample Stage Elevation Range 0-20mm -


Before glow treatment After glow treatment 

Before silicon wafer cleaning:75.9° After silicon wafer cleaning:5.5°
Application Cases
- 产品描述
- 用户界面
- 性能参数
- 应用案例
-
- Commodity name: Glow Discharge Cleaner GDC-100
The “downstream” plasma generated by glow discharge can generate ROS on the surface of the sample, which can improve the hydrophilicity of the sample.
Core Advantages
- Special structural design, short processing time.
- Metal chamber equipped, effectively mitigates electrical breakdown.
- Sample stage adjustable with 20mm travel, supports large sample handling.
- 49-hole copper grid holder included, enables batch processing.
- Fully automated operation, multiple safety interlocks.
-
Parameters of Glow Discharger Cleaner Dimensions (L*W*H) 435*380*310mm Weight 15kg Chamber Dimensions 120*120*120mm Workbench Dimensions Φ70 Touchscreen Dimensions 7 inch Vacuum Pumping Time ﹤1min Cleaning Power 1-100W Sample Stage Elevation Range 0-20mm -


Before glow treatment After glow treatment 

Before silicon wafer cleaning:75.9° After silicon wafer cleaning:5.5°