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Ion Sputter Coater YMC-100

The YMC-100 Ion Sputtering Coating adopts magnetron sputtering coating, which has fast deposition rate and easy coating operation, and is suitable for different kinds of non-conductive samples of scanning electron microscope.

Classification:

Accessories/Auxiliary Equipment

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Core advantages

CORE ADVANTAGES:

  • Magnetron Sputtering Fast Deposition;
  • Multi-Angle All Covered Coating Sample Stage Diameter: 70mm、Tilt Angle: ±35°、 Lifting Distance: 0-20mm;
  • Convenient Touchscreen Operation;
  • Chamber Can Be Used As Sample Vacuum Reservoir.

User Interface

  • 产品描述
  • 用户界面
  • 性能参数
  • 应用案例
    • Commodity name: Ion Sputter Coater YMC-100

    The YMC-100 Ion Sputtering Coating adopts magnetron sputtering coating, which has fast deposition rate and easy coating operation, and is suitable for different kinds of non-conductive samples of scanning electron microscope.

    CORE ADVANTAGES:

    • Magnetron Sputtering Fast Deposition;
    • Multi-Angle All Covered Coating Sample Stage Diameter: 70mm、Tilt Angle: ±35°、 Lifting Distance: 0-20mm;
    • Convenient Touchscreen Operation;
    • Chamber Can Be Used As Sample Vacuum Reservoir.
    • Clean User Interface, Convenient Parameter Settings;
    • Displaying Key Device Parameters During Operation, Whole Process Is Controllable;
    • Modular Design, Quick Switching;
    • Easy Maintenance, No Special Upkeep Required.

  • Parameters of Ion Sputtering Coater
    Overall Dimensions of the Equipment (Length, Width, Height) 435*380*310mm
    Chamber Dimensions 120*120*120mm
    Touchscreen Dimensions 7 itch
    Operating Voltage 220V
    Power 1KW
    Target Dimensions Φ50*0.1mm
    Operating Pressure ＜10Pa
    Vacuum Pumping Time ＜1.5min

           

Performance parameters

  • 产品描述
  • 用户界面
  • 性能参数
  • 应用案例
    • Commodity name: Ion Sputter Coater YMC-100

    The YMC-100 Ion Sputtering Coating adopts magnetron sputtering coating, which has fast deposition rate and easy coating operation, and is suitable for different kinds of non-conductive samples of scanning electron microscope.

    CORE ADVANTAGES:

    • Magnetron Sputtering Fast Deposition;
    • Multi-Angle All Covered Coating Sample Stage Diameter: 70mm、Tilt Angle: ±35°、 Lifting Distance: 0-20mm;
    • Convenient Touchscreen Operation;
    • Chamber Can Be Used As Sample Vacuum Reservoir.
    • Clean User Interface, Convenient Parameter Settings;
    • Displaying Key Device Parameters During Operation, Whole Process Is Controllable;
    • Modular Design, Quick Switching;
    • Easy Maintenance, No Special Upkeep Required.

  • Parameters of Ion Sputtering Coater
    Overall Dimensions of the Equipment (Length, Width, Height) 435*380*310mm
    Chamber Dimensions 120*120*120mm
    Touchscreen Dimensions 7 itch
    Operating Voltage 220V
    Power 1KW
    Target Dimensions Φ50*0.1mm
    Operating Pressure ＜10Pa
    Vacuum Pumping Time ＜1.5min

           

Application Cases

  • 产品描述
  • 用户界面
  • 性能参数
  • 应用案例
    • Commodity name: Ion Sputter Coater YMC-100

    The YMC-100 Ion Sputtering Coating adopts magnetron sputtering coating, which has fast deposition rate and easy coating operation, and is suitable for different kinds of non-conductive samples of scanning electron microscope.

    CORE ADVANTAGES:

    • Magnetron Sputtering Fast Deposition;
    • Multi-Angle All Covered Coating Sample Stage Diameter: 70mm、Tilt Angle: ±35°、 Lifting Distance: 0-20mm;
    • Convenient Touchscreen Operation;
    • Chamber Can Be Used As Sample Vacuum Reservoir.
    • Clean User Interface, Convenient Parameter Settings;
    • Displaying Key Device Parameters During Operation, Whole Process Is Controllable;
    • Modular Design, Quick Switching;
    • Easy Maintenance, No Special Upkeep Required.

  • Parameters of Ion Sputtering Coater
    Overall Dimensions of the Equipment (Length, Width, Height) 435*380*310mm
    Chamber Dimensions 120*120*120mm
    Touchscreen Dimensions 7 itch
    Operating Voltage 220V
    Power 1KW
    Target Dimensions Φ50*0.1mm
    Operating Pressure ＜10Pa
    Vacuum Pumping Time ＜1.5min