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Plasma Cleaner YP-20

Yidon Technologies YP-20 plasma cleaner is mainly used for sample cleaning or vacuum chamber cleaning. It is very versatile and can be integrated with expansion equipments including SEM, FIB, NanoProbe, TEM and other various vacuum equipments.

Classification:

Accessories/Auxiliary Equipment

Price inquiry

Core advantages

CORE ADVANTAGES

  • Inductively coupled Plasma(ICP) technology that generates plasma with much higher particle density than traditional capacitively coupled technology.
  • The high concentration of oxygen radicals generated can effectively remove surface hydrocarbon contaminants on the sample.
  • "DOWNSTREAM" cleaning approach has no damage to the sample to be cleaned and preserves the original surface properties.
  • Operating pressure range: 0.01-500 Pa, will not demage the high vacuum of electron microscope  chamber (turbo pump on).
  • Simple software control, one-button push operation with many stored cleaning recipes.

User Interface

  • 产品描述
  • 用户界面
  • 性能参数
  • 应用案例
    • Commodity name: Plasma Cleaner YP-20

    Yidon Technologies YP-20 plasma cleaner is mainly used for sample cleaning or vacuum chamber cleaning. It is very versatile and can be integrated with expansion equipments including SEM, FIB, NanoProbe, TEM and other various vacuum equipments.

    CORE ADVANTAGES

    • Inductively coupled Plasma(ICP) technology that generates plasma with much higher particle density than traditional capacitively coupled technology.
    • The high concentration of oxygen radicals generated can effectively remove surface hydrocarbon contaminants on the sample.
    • "DOWNSTREAM" cleaning approach has no damage to the sample to be cleaned and preserves the original surface properties.
    • Operating pressure range: 0.01-500 Pa, will not demage the high vacuum of electron microscope  chamber (turbo pump on).
    • Simple software control, one-button push operation with many stored cleaning recipes.

  • ​​​​​​

    • Mount on electron microscope chamber, or vacuum apparatus to be cleaned, easy installation with KF 40 quick connector.
    • With many stored cleaning recipes for routine work, remote operation available.
    • User-friendly interface , operates from computer that runs the microscope.
    • Both samples and vacuum chambers, vessels can be cleaned.

     

  •             PLASMA SOURCE PARAMETERS                         CONTROL CABINET PARAMETERS            
                Power            

                5-100W            

    		 Dimensions L*W*H             428*290*116mm
    Operating pressure 0.01-500Pa Weight 6kg
    Gas type Air, O2, Ar Power requirements

    110/220VAC, 50/60Hz, RF frequency:13.56MHz

    Power consumption:200VA Characteristic resistance:50Ω
    Vacuum interface type KF40
    Dimensions L*W*H 205*104*104mm Communications Ethernet
    Weight 2kg Software Dedicated control software

           

  • Silicon wafer sample

    Before cleaning: There is obvious carbon deposit in the central area

    After cleaning: the carbon deposits are cleaned

Performance parameters

  • 产品描述
  • 用户界面
  • 性能参数
  • 应用案例
    • Commodity name: Plasma Cleaner YP-20

    Yidon Technologies YP-20 plasma cleaner is mainly used for sample cleaning or vacuum chamber cleaning. It is very versatile and can be integrated with expansion equipments including SEM, FIB, NanoProbe, TEM and other various vacuum equipments.

    CORE ADVANTAGES

    • Inductively coupled Plasma(ICP) technology that generates plasma with much higher particle density than traditional capacitively coupled technology.
    • The high concentration of oxygen radicals generated can effectively remove surface hydrocarbon contaminants on the sample.
    • "DOWNSTREAM" cleaning approach has no damage to the sample to be cleaned and preserves the original surface properties.
    • Operating pressure range: 0.01-500 Pa, will not demage the high vacuum of electron microscope  chamber (turbo pump on).
    • Simple software control, one-button push operation with many stored cleaning recipes.

  • ​​​​​​

    • Mount on electron microscope chamber, or vacuum apparatus to be cleaned, easy installation with KF 40 quick connector.
    • With many stored cleaning recipes for routine work, remote operation available.
    • User-friendly interface , operates from computer that runs the microscope.
    • Both samples and vacuum chambers, vessels can be cleaned.

     

  •             PLASMA SOURCE PARAMETERS                         CONTROL CABINET PARAMETERS            
                Power            

                5-100W            

    		 Dimensions L*W*H             428*290*116mm
    Operating pressure 0.01-500Pa Weight 6kg
    Gas type Air, O2, Ar Power requirements

    110/220VAC, 50/60Hz, RF frequency:13.56MHz

    Power consumption:200VA Characteristic resistance:50Ω
    Vacuum interface type KF40
    Dimensions L*W*H 205*104*104mm Communications Ethernet
    Weight 2kg Software Dedicated control software

           

  • Silicon wafer sample

    Before cleaning: There is obvious carbon deposit in the central area

    After cleaning: the carbon deposits are cleaned

Application Cases

  • 产品描述
  • 用户界面
  • 性能参数
  • 应用案例
    • Commodity name: Plasma Cleaner YP-20

    Yidon Technologies YP-20 plasma cleaner is mainly used for sample cleaning or vacuum chamber cleaning. It is very versatile and can be integrated with expansion equipments including SEM, FIB, NanoProbe, TEM and other various vacuum equipments.

    CORE ADVANTAGES

    • Inductively coupled Plasma(ICP) technology that generates plasma with much higher particle density than traditional capacitively coupled technology.
    • The high concentration of oxygen radicals generated can effectively remove surface hydrocarbon contaminants on the sample.
    • "DOWNSTREAM" cleaning approach has no damage to the sample to be cleaned and preserves the original surface properties.
    • Operating pressure range: 0.01-500 Pa, will not demage the high vacuum of electron microscope  chamber (turbo pump on).
    • Simple software control, one-button push operation with many stored cleaning recipes.

  • ​​​​​​

    • Mount on electron microscope chamber, or vacuum apparatus to be cleaned, easy installation with KF 40 quick connector.
    • With many stored cleaning recipes for routine work, remote operation available.
    • User-friendly interface , operates from computer that runs the microscope.
    • Both samples and vacuum chambers, vessels can be cleaned.

     

  •             PLASMA SOURCE PARAMETERS                         CONTROL CABINET PARAMETERS            
                Power            

                5-100W            

    		 Dimensions L*W*H             428*290*116mm
    Operating pressure 0.01-500Pa Weight 6kg
    Gas type Air, O2, Ar Power requirements

    110/220VAC, 50/60Hz, RF frequency:13.56MHz

    Power consumption:200VA Characteristic resistance:50Ω
    Vacuum interface type KF40
    Dimensions L*W*H 205*104*104mm Communications Ethernet
    Weight 2kg Software Dedicated control software

           

  • Silicon wafer sample

    Before cleaning: There is obvious carbon deposit in the central area

    After cleaning: the carbon deposits are cleaned